Prop 2 Fuse conundrum - Vpp ?!

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  • I should point out there is already 16 symmetrical Streamers that can provide burst data in this very fashion. But obviously can quickly become pin count limited.

    Just requires a little management to suit a particular interface.
    The Prisoner's Dilemma, in english - "Selfishness beats altruism within groups. Altruistic groups beat selfish groups." - Quoted part from 2007, D.S Wilson/E.O Wilson.
  • .. and another company offers NV memory... this one targets the higher voltage/automotive nodes, and so is on 0.18um

    https://www10.edacafe.com/nbc/articles/1/1542783/eMemory-Unveils-Auto-Grade-EEPROM-IP-with-over-500K-Cycle-Endurance

    "The enhanced NeoEE is fully compatible with standard logic and Bipolar-CMOS-DMOS (BCD) process without the need for additional masks and process steps. The IP has been silicon verified at 0.18um/5V process, and technology development is underway for other 5V platforms."

    http://www.ememory.com.tw/html/products_neoee.php

    They also show

    http://www.ememory.com.tw/html/products_neomtp.php

    "NeoMTP is fully compatible with logic process, needing zero additional masks for 3.3V IO devices and 5V IO devices. Both types use a standard logic process without the need for any additional thermal budget. NeoMTP technology can deliver NVM block in system/in field programmability, maintaining high reliability, endurance and data retention over 10 years at 85° C 3.3V gate oxide) and over 10 years at 125° C (5V gate oxide) without any extra manufacturing costs"


    and this for Flash, which does need more masks...

    http://www.ememory.com.tw/html/products_neoflash.php

    "NeoFlash can be embedded in CMOS logic processes with only 2–3 additional non-critical masks. While floating gate flash technology requires a complex and expensive double poly process (needing up to 11 additional mask layers), NeoFlash’s single poly architecture and stripped-down manufacturing give it powerful advantages in the embedded flash category, especially in advanced nodes"
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